Turbo-V 2K-G

The Agilent high throughput turbomolecular pump, Turbo-V 2K-G, is a dedicated vacuum pumping system, designed specifically as a turbo pump for thin film deposition equipment. Its pumping stages, and the entire pump structure, are optimized to work with very high flows of Argon under high temperature load.

This robust turbo pump is suitable for harsh manufacturing environments because of its rugged design. Typical industrial vacuum coating applications include physical vapor deposition (PVD), solar and flat panel display manufacturing.

The pump’s robust design and its advanced electronics, rack type or onboard solution, make the Agilent Turbo-V 2K-G the optimum pumping solution for the vacuum coating industry.

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Features

  • The first application-specific pumping solution designed for thin film deposition equipment
  • The highest performing, most compact unit available
  • The first fully integrated approach for maximum system productivity and uptime
  • Integrated package includes Turbo Molecular Pump, Drive Electronics, Power Supply, MoniTorr, Purge Gas and Communication
  • Versatile electronics interface with easy to use control Software Analog I/O signals and RS232 / RS485 interface as standard
  • Agilent Profibus interface (optional)
  • Utilizes Agilent's A-PLUS software (formerly T-plus)
  • Typical Turbo Pump Applications

Specifications

Pumping speed: N2: 1600 l/s
Compression ratio: N2: 3 x 105
Base pressure* (with recommended forepump) <1 x 10-8 mbar
Inlet flange ISO 250F
Foreline flange KF 40 NW
Nominal rotational speed 33,000 rpm
Start-up time <7 minutes
Recommended forepump > 40 m3 /h
Operating position Any
Operating ambient temperature +5 °C to +40 °C
Power supply 100 – 240 Vac
Input voltage 50 – 60 Hz
Input freq.
Communication interface Analogue I/O Standard
RS232 / RS485 Standard
Profibus Optional
Dimensions Height 335 mm (13.18 in.)
Weight 335 mm (13.18 in.)
Diameter 35 kg (77 lbs)

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